Implementation of the inductively coupled plasma etching...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2020 / 07 Vol. 38; Iss. 4

Implementation of the inductively coupled plasma etching processes for forming gallium nitride nanorods used in ultraviolet light-emitting diode technology

Ekielski, Marek, Wzorek, Marek, Gołaszewska, Krystyna, Domanowska, Alina, Taube, Andrzej, Sochacki, Mariusz
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Volume:
38
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/6.0000133
Date:
July, 2020
File:
PDF, 3.20 MB
2020
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