Determination of silicon wafer site flatness using dual...

Review of Scientific Instruments 2020 / 06 Vol. 91; Iss. 6

Determination of silicon wafer site flatness using dual heterodyne interferometers with sub-nanometer precision

Tahara, Kazuhiko, Matsuoka, Hideki, Morioka, Noritaka, Tsunaki, Hidetoshi, Kannaka, Masato, Kita, Takashi
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Volume:
91
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.5143534
Date:
June, 2020
File:
PDF, 1.89 MB
2020
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