A comparison of graphite and AlN caps used for annealing...

Journal of Electronic Materials 2002 Vol. 31; Iss. 6

A comparison of graphite and AlN caps used for annealing ion-implanted SiC

K. A. Jones, M. A. Derenge, P. B. Shah, T. S. Zheleva, M. H. Ervin, K. W. Kirchner, M. C. Wood, C. Thomas, M. G. Spencer, O. W. Holland, R. D. Vispute
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Volume:
31
Year:
2002
Language:
english
Pages:
8
DOI:
10.1007/s11664-002-0127-2
File:
PDF, 724 KB
english, 2002
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