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Highly concentrated ozone gas supplied at an atmospheric pressure condition as a new oxidizing reagent for the formation of SiO2thin film on Si
Kunihiko Koike, Shingo Ichimura, Akira Kurokawa, Ken NakamuraVolume:
31
Year:
2002
Language:
english
Pages:
5
DOI:
10.1007/s11664-002-0155-y
File:
PDF, 162 KB
english, 2002