Oxygen segregation and Ge diffusion in annealed oxygen...

Journal of Electronic Materials 2004 Vol. 33; Iss. 3

Oxygen segregation and Ge diffusion in annealed oxygen ion-implanted relaxed SiGe/Si heterostructures

Zhenghua An, Miao Zhang, Ricky K. Y. Fu, Paul K. Chu, Chenglu Lin
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Volume:
33
Year:
2004
Language:
english
Pages:
6
DOI:
10.1007/s11664-004-0181-z
File:
PDF, 401 KB
english, 2004
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