Synthesis of silicon dioxide film using high-concentration...

Journal of Electronic Materials 2005 Vol. 34; Iss. 3

Synthesis of silicon dioxide film using high-concentration ozone and evaluation of the film quality

Kunihiko Koike, Koichi Izumi, Sadaki Nakamura, Goichi Inoue, Akira Kurokawa, Shingo Ichimura
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Volume:
34
Year:
2005
Language:
english
Pages:
8
DOI:
10.1007/s11664-005-0210-6
File:
PDF, 424 KB
english, 2005
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