Novel multilayered Ti/TiN diffusion barrier for Al metallization
Wen-Fa Wu, Kou-Chiang Tsai, Chuen-Guang Chao, Jen-Chung Chen, Keng-Liang OuVolume:
34
Year:
2005
Language:
english
Pages:
7
DOI:
10.1007/s11664-005-0244-9
File:
PDF, 301 KB
english, 2005