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Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films
Kuo, Chin-Chiuan, Lin, Chun-Hui, Lin, Yu-Tse, Chang, Jing-TangVolume:
10
Journal:
Coatings
DOI:
10.3390/coatings10060542
Date:
June, 2020
File:
PDF, 5.52 MB
2020