Controlled Growth of Non-Uniform Arsenic Profiles in Silicon Reduced-Pressure Chemical Vapor Deposition Epitaxial Layers
M. Popadić, T. L. M. Scholtes, W. de Boer, F. Sarubbi, L. K. NanverVolume:
38
Language:
english
Pages:
6
DOI:
10.1007/s11664-009-0897-x
Date:
November, 2009
File:
PDF, 278 KB
english, 2009