Fifteen-Nanometer Ru Diffusion Barrier on NiSi/Si for a sub-45
Jia-Huei Lin, Jiing-Herng Lee, Chen-Sheng Hsu, Jau-Shiung FangVolume:
38
Language:
english
Pages:
6
DOI:
10.1007/s11664-009-0899-8
Date:
November, 2009
File:
PDF, 479 KB
english, 2009