A new LPE growth method of semiconductor heterostructures with thickness profile variation of epitaxial layers
V. A. Mishurnyi, F. De Anda, A. Yu. Gorbatchev, I. C. Hernández, Del Castillo, J. Nieto-NavarroVolume:
27
Year:
1998
Language:
english
Pages:
2
DOI:
10.1007/s11664-998-0134-z
File:
PDF, 126 KB
english, 1998