A new LPE growth method of semiconductor heterostructures...

A new LPE growth method of semiconductor heterostructures with thickness profile variation of epitaxial layers

V. A. Mishurnyi, F. De Anda, A. Yu. Gorbatchev, I. C. Hernández, Del Castillo, J. Nieto-Navarro
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Volume:
27
Year:
1998
Language:
english
Pages:
2
DOI:
10.1007/s11664-998-0134-z
File:
PDF, 126 KB
english, 1998
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