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Study on ta diffusion barrier in Al/Si system
Jaehwa Kim, Dong-Soo Yoon, Joon Seop Kwak, Hong Koo Baik, Sung-Man LeeVolume:
28
Year:
1999
Language:
english
Pages:
7
DOI:
10.1007/s11664-999-0187-7
File:
PDF, 698 KB
english, 1999