Fabrication of High TCR TaAl-N Thin Film by Reactive...

Shinku 2007 Vol. 50; Iss. 3

Fabrication of High TCR TaAl-N Thin Film by Reactive Sputtering Method

OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi
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Volume:
50
Year:
2007
Journal:
Shinku
DOI:
10.3131/jvsj.50.173
File:
PDF, 338 KB
2007
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