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Low temperature annealing behaviors of the titanium films formed by the ionized sputtering process on (001) silicon substrates
Eun-Ha Kim, Dae-Hong Ko, Siyoung Choi, Bong-Young Yoo, Hyeon-Deok LeeVolume:
28
Year:
1999
Language:
english
Pages:
1
DOI:
10.1007/s11664-999-0253-1
File:
PDF, 1015 KB
english, 1999