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Initial conditions for preparation of thin AlN films by atomic layer deposition
Beshkova, M, Blagoev, B S, Mehandzhiev, V, Yakimova, R, Georgieva, B, Avramova, I, Terziyska, P, Kovacheva, D, Strijkova, VVolume:
1492
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/1492/1/012021
Date:
April, 2020
File:
PDF, 1.00 MB
2020