Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82
Mpatzaka, Th., Zisis, G., Raptis, I., Vamvakas, V., Kaiser, C., Mai, T., Schirmer, M., GerngroÃ, M., Papageorgiou, G.Volume:
8
Journal:
Micro and Nano Engineering
DOI:
10.1016/j.mne.2020.100065
Date:
August, 2020
File:
PDF, 1.98 MB
2020