Etching Characteristics of SixNy Film on Textured Single...

Coatings 2020 / 06 Vol. 10; Iss. 6

Etching Characteristics of SixNy Film on Textured Single Crystalline Silicon Surface Using Ar/CF4 and He/CF4 Surface-Discharge Plasma

Hamada, Toshiyuki, Masuda, Shunsuke, Nishida, Kazuki, Yamamoto, Soma
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Volume:
10
Journal:
Coatings
DOI:
10.3390/coatings10060563
Date:
June, 2020
File:
PDF, 3.68 MB
2020
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