Phase Equilibria and Reactive Chemical Vapor Deposition (RCVD) of Ti3SiC2
H. Fakih, S. Jacques, O. Dezellus, M.P. Berthet, F. Bosselet, M. Sacerdote-Peronnet, J.C. VialaVolume:
29
Language:
english
Pages:
8
DOI:
10.1007/s11669-008-9284-1
Date:
June, 2008
File:
PDF, 492 KB
english, 2008