A novel removal strategy for copper and arsenic by...

Chemical Engineering Journal 2020 / 12 Vol. 401

A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism

Ding, Wei, Tong, Hui, Zhao, Dan, Zheng, Huaili, Liu, Chengshuai, Li, Jinjun, Wu, Feng
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Volume:
401
Journal:
Chemical Engineering Journal
DOI:
10.1016/j.cej.2020.126102
Date:
December, 2020
File:
PDF, 1.68 MB
2020
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