Oxygen Radical Control via Atmospheric Pressure Plasma...

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IEEE Transactions on Electron Devices 2020

Oxygen Radical Control via Atmospheric Pressure Plasma Treatment for Highly Stable IGZO Thin-Film Transistors

Lee, Eun Goo, Park, Jintaek, Lee, Sung-Eun, Na, Hyun-Jae, Cho, Nam-Kwang, Im, Changik, Cho, Yong Hyun, Kim, Youn Sang
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Year:
2020
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/TED.2020.3000736
File:
PDF, 2.23 MB
2020
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