Optimal Inter-Gate Separation and Overlapped Source of...

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IEEE Open Journal of Nanotechnology 2020

Optimal Inter-Gate Separation and Overlapped Source of Multi-Channel Line Tunnel FETs

Thoti, Narasimhulu, Li, Yiming, Kola, Sekhar Reddy, Samukawa, Seiji
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Year:
2020
Journal:
IEEE Open Journal of Nanotechnology
DOI:
10.1109/OJNANO.2020.2998939
File:
PDF, 4.90 MB
2020
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