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Precise measurement of the temperature of a silicon wafer by an optical-interference contactless thermometer during rapid plasma processing
Kameda, Asaki, Mizukawa, Yuri, Hanafusa, Hiroaki, Higashi, SeiichiroVolume:
127
Journal:
Journal of Applied Physics
DOI:
10.1063/1.5143834
Date:
May, 2020
File:
PDF, 3.23 MB
2020