The Growth of AlN Single Layer on Sapphire at Low Pressure...

Journal of Physics Conference Series 2020 / 05 Vol. 1535

The Growth of AlN Single Layer on Sapphire at Low Pressure using Metalorganic Chemical Vapor Deposition (MOCVD)

Sahar, M.A.A.Z. Md, Hassan, Z., Lim, W.F., Samsudin, M.E.A., Hanafiah, A.M., Yusuf, Y., Ahmad, M.A., Hamzah, N.A., Asri, R.I.M.
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Volume:
1535
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/1535/1/012042
Date:
May, 2020
File:
PDF, 926 KB
2020
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