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Anticorrosive Behavior of SiC x N y O z Film Formed by Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane, Nitrogen and Argon Gases
Watanabe, Toru, Hori, Kenta, Habuka, HitoshiVolume:
9
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2162-8777/ab6161
Date:
January, 2020
File:
PDF, 1.49 MB
2020