Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2020 / 07 Vol. 38; Iss. 4
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Correlation between electromigration-related void volumes and time-to-failure, the high-resolution x-ray tomographyâs vital support
Moreau, Stéphane, Fraczkiewicz, AlexandraVolume:
38
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/6.0000252
Date:
July, 2020
File:
PDF, 1.94 MB
2020