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[IEEE 2020 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2020.6.13-2020.6.14)] 2020 IEEE Silicon Nanoelectronics Workshop (SNW) - Study on Etch Slope in Fin and Source/Drain Etch Process of Vertically-Stacked Nanosheet Gate-All-Around MOSFET
Kim, Sihyun, Lee, Kitae, Park, Byung-GookYear:
2020
DOI:
10.1109/SNW50361.2020.9131424
File:
PDF, 4.05 MB
2020