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Simulation of gas phase reactions for microcrystalline silicon films fabricated by PECVD
Bao-hua He, Shi-e Yang, Yong-sheng Chen, Jing-xiao LuVolume:
7
Language:
english
Pages:
4
DOI:
10.1007/s11801-011-0127-7
Date:
May, 2011
File:
PDF, 175 KB
english, 2011