Integration of Dielectric and Ferroelectric Hafnium Aluminum Oxides for ThinâFilm Transistor Applications
Hsu, Hsiao-Hsuan, Lee, Sheng, Liu, Hsiu-MingJournal:
physica status solidi (RRL) â Rapid Research Letters
DOI:
10.1002/pssr.202000258
Date:
July, 2020
File:
PDF, 1.24 MB
2020