Run-to-Run Control of Chemical Mechanical Polishing Process...

  • Main
  • 2020
  • Run-to-Run Control of Chemical Mechanical Polishing Process...
IEEE Transactions on Semiconductor Manufacturing 2020

Run-to-Run Control of Chemical Mechanical Polishing Process Based on Deep Reinforcement Learning

Yu, Jianbo, Guo, Peng
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2020
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2020.3002896
File:
PDF, 11.42 MB
2020
Conversion to is in progress
Conversion to is failed