Cyclic etching of copper thin films using HBr and Ar gases
Lim, Eun Taek, Cha, Moon Hwan, Park, Sung Yong, Lee, Ji Su, Chung, Chee WonVolume:
38
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/6.0000218
Date:
July, 2020
File:
PDF, 1.41 MB
2020