Comparison of Degradation and Recovery of SiONx and...

Key Engineering Materials 2020 / 5 Vol. 843

Comparison of Degradation and Recovery of SiONx and Hf-Based Dielectric under Electrical-Field Stress

Chen, Jian Ming, Lo, Chi Hao, Wang, Mu Chun, Shen, Tien Szu, Chou, Ching Chuan, Liao, Wen Shiang, Lan, Wen How
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Volume:
843
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.843.47
Date:
May, 2020
File:
PDF, 2.47 MB
2020
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