Mechanisms of GaAs surface passivation by a one-step dry process using low-frequency plasma enhanced chemical deposition of silicon nitride
Richard, Olivier, Blais, Sonia, Arès, Richard, Aimez, Vincent, Jaouad, AbdelatifJournal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2020.111398
Date:
July, 2020
File:
PDF, 441 KB
2020