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Deep reactive ion etching of silicon using non-ICP-based equipment
Du, Zaifa, Nie, Junyang, Li, Dianlun, Guo, Weiling, Yan, Qun, Wang, Le, Guo, Tailiang, Sun, JieVolume:
126
Journal:
Applied Physics A
DOI:
10.1007/s00339-020-03732-x
Date:
July, 2020
File:
PDF, 1.02 MB
2020