Stress relaxation mechanism by strain in the Si-SiO...

IOP Conference Series Materials Science and Engineering 2011 / 12 Vol. 25

Stress relaxation mechanism by strain in the Si-SiO 2 system and its influence on the interface properties

Kropman, D, Mellikov, E, Karner, T, Medvid, A, Onufrijevs, P, Dauksta, E
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Volume:
25
Journal:
IOP Conference Series: Materials Science and Engineering
DOI:
10.1088/1757-899x/25/1/012018
Date:
December, 2011
File:
PDF, 581 KB
2011
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