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Physical characterization of ultrathin silicon oxynitrides grown by Rapid Thermal Processing aiming to MOS tunnel devices
Christiano, V, Filho, S G dos SantosVolume:
76
Journal:
IOP Conference Series: Materials Science and Engineering
DOI:
10.1088/1757-899x/76/1/012002
Date:
March, 2015
File:
PDF, 914 KB
2015