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Applied Surface Science 2020 / 7

Schottky Barrier Engineering with a Metal Nitride–Double Interlayer–Semiconductor Contact Structure to Achieve High Thermal Stability and Ultralow Contact Resistivity

Park, Euyjin, Kim, Seung-Hwan, Yu, Hyun-Yong
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Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.147329
Date:
July, 2020
File:
PDF, 2.05 MB
2020
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