Increasing the Voltage Modulation Depth of the RF Produced...

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IEEE Transactions on Plasma Science 2020

Increasing the Voltage Modulation Depth of the RF Produced by NLTL

Neto, Lauro P. Silva, Moraes, Henrique M., Rossi, Jose O., Barroso, Joaquim J., Rangel, Elizete G. Lopes
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Year:
2020
Journal:
IEEE Transactions on Plasma Science
DOI:
10.1109/TPS.2020.3000216
File:
PDF, 1.94 MB
2020
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