Physics and Technology of Silicon Carbide Devices ||...

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Physics and Technology of Silicon Carbide Devices || Etching of Silicon Carbide Using Chlorine Trifluoride Gas

Hijikata, Yasuto
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Volume:
10.5772/34
Year:
2012
DOI:
10.5772/50387
File:
PDF, 2.67 MB
2012
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