Plasma-enhanced chemical vapour deposition of fluorinated...

Plasma-enhanced chemical vapour deposition of fluorinated silicon dioxide films using novel alkylsilanes

Ravi K. Laxman, Arthur K. Hochberg, David A. Roberts, Raymond N. Vrtis, Saul Ovalle
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Volume:
6
Year:
1996
Language:
english
Pages:
7
DOI:
10.1002/(sici)1099-0712(199603)6:23.0.co;2-z
File:
PDF, 530 KB
english, 1996
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