Global model for pulsed inductively coupled plasma sources:...

Global model for pulsed inductively coupled plasma sources: Effect of edge-to-center density ratio and electron heating

Kwon, Deuk-Chul, Yu, Dong-Hun, Kwon, Hyoungcheol, Im, Yeon Ho, Lee, Hyo-Chang
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Volume:
27
Journal:
Physics of Plasmas
DOI:
10.1063/5.0006505
Date:
July, 2020
File:
PDF, 2.85 MB
2020
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