Impact of post-annealing of tunnel oxide on the electrical...

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Journal of Materials Science: Materials in Electronics 2020 / 7

Impact of post-annealing of tunnel oxide on the electrical characteristics of Pt–Ti/HfO2/TiN/SiON/n-Si capacitor for flash memory applications

Vaid, Rakesh, Rajput, Renu
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Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-020-04091-2
Date:
July, 2020
File:
PDF, 1.70 MB
2020
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