First Wafer Effect of Multiple SiO2/SiN Stack Layers...

Journal of the Korean Physical Society 2020 / 5 Vol. 76; Iss. 10

First Wafer Effect of Multiple SiO2/SiN Stack Layers Prepared by using Plasma-enhanced Chemical Vapor Deposition

Kim, Min Su, Kwon, Hojoong, Kim, Hyoyoung, Park, Seung-ho, Lee, Jeong Woo, Na, Kyung Pil, Kong, Chul Min, Kim, Yong Gab
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Volume:
76
Journal:
Journal of the Korean Physical Society
DOI:
10.3938/jkps.76.911
Date:
May, 2020
File:
PDF, 1.01 MB
2020
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