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Effect of rapid thermal annealing on damage of silicon matrix implanted by low-energy rhenium ions
Demchenko, I.N., Melikhov, Y., Walczak, M.S., Ratajczak, R., Sobczak, K., Barcz, A., Minikaev, R., Dynowska, E., Domagala, J.Z., Chernyshova, M., Syryanyy, Y., Gavrilov, N.V., Sawicki, M.Journal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2020.156433
Date:
July, 2020
File:
PDF, 4.10 MB
2020