Etch selectivity during plasma-assisted etching of SiO...

Etch selectivity during plasma-assisted etching of SiO 2 and SiN x : Transitioning from reactive ion etching to atomic layer etching

Gasvoda, Ryan J., Zhang, Zhonghao, Wang, Scott, Hudson, Eric A., Agarwal, Sumit
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
38
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/6.0000395
Date:
September, 2020
File:
PDF, 5.79 MB
2020
Conversion to is in progress
Conversion to is failed