A run-to-run controller for a chemical mechanical...

A run-to-run controller for a chemical mechanical planarization process using least squares generative adversarial networks

Kim, Sinyoung, Jang, Jaeyeon, Kim, Chang Ouk
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Journal:
Journal of Intelligent Manufacturing
DOI:
10.1007/s10845-020-01639-1
Date:
August, 2020
File:
PDF, 2.11 MB
2020
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