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[IEEE 2020 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR) - Seattle, WA, USA (2020.6.13-2020.6.19)] 2020 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR) - BlendMask: Top-Down Meets Bottom-Up for Instance Segmentation
Chen, Hao, Sun, Kunyang, Tian, Zhi, Shen, Chunhua, Huang, Yongming, Yan, YouliangYear:
2020
DOI:
10.1109/CVPR42600.2020.00860
File:
PDF, 820 KB
2020