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Optimization of the melt/crystal interface shape and oxygen concentration during the Czochralski silicon crystal growth process using an artificial neural network and a genetic algorithm
Qi, Xiaofang, Ma, Wencheng, Dang, Yifan, Su, Wenjia, Liu, LijunVolume:
548
Journal:
Journal of Crystal Growth
DOI:
10.1016/j.jcrysgro.2020.125828
Date:
October, 2020
File:
PDF, 1.02 MB
2020