Non-linear Raman shift-stress behavior in top-down...

Journal of Applied Physics 2020 / 07 Vol. 128; Iss. 4

Non-linear Raman shift-stress behavior in top-down fabricated highly strained silicon nanowires

Spejo, L. B., Arrieta-Concha, J. L., Puydinger dos Santos, M. V., Barros, A. D., Bourdelle, K. K., Diniz, J. A., Minamisawa, R. A.
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Volume:
128
Journal:
Journal of Applied Physics
DOI:
10.1063/5.0013284
Date:
July, 2020
File:
PDF, 1.71 MB
2020
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