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Stability of ferroelectric and antiferroelectric hafniumâzirconium oxide thin films
Chae, Kisung, Hwang, Jeongwoon, Chagarov, Evgueni, Kummel, Andrew, Cho, KyeongjaeVolume:
128
Journal:
Journal of Applied Physics
DOI:
10.1063/5.0011547
Date:
August, 2020
File:
PDF, 2.65 MB
2020