Area-selective atomic layer deposition of TiN using...

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Chemistry of Materials 2020 / 08

Area-selective atomic layer deposition of TiN using aromatic inhibitor molecules for metal/dielectric selectivity

Merkx, Marc J.M., Vlaanderen, Sander, Faraz, Tahsin, Verheijen, Marcel A., Kessels, Wilhelmus M.M., Mackus, Adriaan J. M.
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Journal:
Chemistry of Materials
DOI:
10.1021/acs.chemmater.0c02370
Date:
August, 2020
File:
PDF, 594 KB
2020
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